Study of Copper Residue Generated During Cu CMP Process
نویسندگان
چکیده
منابع مشابه
Copper CMP and Process Control
A production worthy, copper CMP technology has been successfully developed on a multi-platen CMP system. The System consists of three polish platens, each of which is equipped with an optical endpoint detection system. The process consists of three steps with different polish slurries, and is designed to polish copper with a tantalum based barrier, and to achieve good defect performance. Patter...
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The aim of this research is to get a better understanding of the electrolytic refining process in order to yield the anode slime. Three types of secondary copper anodes are electro refined in an electrolytic system, where the electrolyte is an acid of copper sulphate solution. As a result of the electro-refining process the anode slime has been gained as secondary product. The experimental ...
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In the Chemical Mechanical Polishing (CMP) process used for microelectronics manufacturing, three contact regimes between the wafer surface and the polishing pad may be proposed: direct contact, mixed or partial contact, and hydroplaning. An effective in-situ method for characterizing the wafer/pad contact and a systematic way of relating contact conditions to the process parameters are both la...
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Results from experiments on the removal of copper using chemical mechanical polishing ~CMP! by alumina abrasives suspended in deionized water are reported. The experiments were carried out in a benchtop polishing tool using IC1000 perforated pads and SUBA 500 pads. The removal rate was measured over a good range of values of the relative velocity and pressure, and for different values of the ab...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 2009
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.75.617